枚葉轉盤式濺鍍機Apollogon
電洽
【Introduction】
Industry : Sputtering for photoelectric industry
Features : High deposition rate and High
uniformity
Application : ITO/CIGS/Ag coating、reactive
sputtering
適用產業:光電產業鍍膜
機器特色:高鍍率、高均勻度、高靶材利用率
適用場合:ITO/CIGS鍍膜、貴重金屬鍍膜應用、反應式鍍膜應用
【Specification】
Chambers : 2V//4V
Substrate size : 480L*330W*5H (mm)
Cycle time : 12~30sec
Application : ITO/CIGS/Ag/SiO2/TiO2
Up time : 94%
Vertical / Horizontal type
Target utilization : 60%
Uniformity : ± 5%